The semiconductor industry forecasts a doubling of the performances of electronic components every 18 months. However, the current printing technology - lithography – has to address the physical constraints of ever-greater miniaturization of silicon chips. CEA-Leti in Paris and the french company Arkema, in association with LCPO (Laboratoire de Chimie des Polymères Organiques) of Bordeaux – France, have succeeded in going beyond the boundaries of the infinitely small by showing the unique resolution potential of lithography based on nanostructured polymers. These initial results meet the requirements of the next 4 generations of electronic chips. Building on this success, CEA-Leti and Arkema have created a development platform dedicated to this technology.