Beyond the Boundaries Of the Infinitely Small

Calendar May 15, 2012 | Posted by Alain

The semiconductor industry forecasts a doubling of  the performances of electronic components every 18 months. However, the current printing technology - lithography – has to address the physical constraints of ever-greater miniaturization of silicon chips. CEA-Leti in Paris and the french company Arkema, in association with LCPO (Laboratoire de Chimie des Polymères Organiques)  of Bordeaux – France, have succeeded in going beyond the boundaries of the infinitely small by showing the unique resolution potential of lithography based on nanostructured polymers. These initial results meet the requirements of the  next 4 generations of electronic chips. Building on this success, CEA-Leti and Arkema have  created a development platform dedicated to this technology. 

 
As part of their joint laboratory, Arkema and CEA-Leti, with the help of Professor Hadziioannou’s 
team of LCPO, have successfully obtained a 20 nanometer (nm) pitch* and reduced the diameter of 
contacts down to 7 nm thanks to nanostructured polymers, thereby demonstrating the compatibility 
of this technology for technological nodes ranging from 20 nm to sub-10 nm.  
 
Source: http://www.arkema.com/pdf/EN/press_release/2012/cp_arkema_leti_va.pdf

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